JPH0282030U - - Google Patents
Info
- Publication number
- JPH0282030U JPH0282030U JP16280488U JP16280488U JPH0282030U JP H0282030 U JPH0282030 U JP H0282030U JP 16280488 U JP16280488 U JP 16280488U JP 16280488 U JP16280488 U JP 16280488U JP H0282030 U JPH0282030 U JP H0282030U
- Authority
- JP
- Japan
- Prior art keywords
- generation chamber
- plasma
- chamber
- excitation coil
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005284 excitation Effects 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 230000035699 permeability Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16280488U JPH0282030U (en]) | 1988-12-15 | 1988-12-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16280488U JPH0282030U (en]) | 1988-12-15 | 1988-12-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0282030U true JPH0282030U (en]) | 1990-06-25 |
Family
ID=31446966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16280488U Pending JPH0282030U (en]) | 1988-12-15 | 1988-12-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0282030U (en]) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02205020A (ja) * | 1989-02-03 | 1990-08-14 | Hitachi Ltd | マイクロ波プラズマ処理装置 |
| JPH04306598A (ja) * | 1990-10-16 | 1992-10-29 | Internatl Business Mach Corp <Ibm> | 電子サイクロトロン共鳴装置と基板へのイオンの流れを生成する方法 |
-
1988
- 1988-12-15 JP JP16280488U patent/JPH0282030U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02205020A (ja) * | 1989-02-03 | 1990-08-14 | Hitachi Ltd | マイクロ波プラズマ処理装置 |
| JPH04306598A (ja) * | 1990-10-16 | 1992-10-29 | Internatl Business Mach Corp <Ibm> | 電子サイクロトロン共鳴装置と基板へのイオンの流れを生成する方法 |